Product Description
Edited by William B.
Glendinning and John N.
Helbert, this 1991 technical volume is a detailed reference work on the science and engineering of microlithography?the core process used to manufacture integrated circuits in microelectronics.
The book explains how patterns are transferred onto semiconductor wafers using light, electron beams, and X-ray techniques.
It covers both theoretical foundations and practical applications, including photoresist chemistry, optical systems, resolution limits, and process control.
Topics such as positive vs.
negative resists, thin-film behavior, and defect management are addressed in depth.
As part of a broader materials science and process technology series, it compiles contributions from multiple experts, making it a comprehensive snapshot of lithographic technology at the dawn of the modern VLSI (Very Large Scale Integration) era.
It is aimed primarily at engineers, researchers, and advanced students working in semiconductor fabrication.
THIS "Review Copy" was delivered before the actual publication date of 1/15/1992.
Hard cover edition with unclipped dustjacket.
649 pages.
Dimensions: 6.25" by 9.5".
Published by Noyes Data Corporation, NJ.
1st printing, 1991.
B&W illustrations.
B&W photographs.
Black binding.
Dustjacket defect(s): Some tears.
Some wrinkling/creasing.
3.25 Pound Media Shipping Rate with Multiple Product Orders.
(Min Shipping Rate 1 Pound per Order).
Order More and SAVE! Genre(s): Electronics / Technology / Semiconductors / English.
(B106)
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